United States Patent #4,569,718 – Method for Plasma Etching III-V Semiconductors with a BCL3-CL2 Gas, 1986, undated
File — Box: 52, Folder: 49
Dates
- Creation: 1986, undated
Repository Details
Part of the Science History Institute Archives Repository
Contact:
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215.873.8265
215.873.5265 (Fax)
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315 Chestnut Street
Philadelphia PA 19106 United States
215.873.8265
215.873.5265 (Fax)
reference@sciencehistory.org